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Over the years we've developed a masking technique to deposit two or more thinfilm coating designs on a single substrate. On the coating boundaries where light leaks are a concern, the two coatings overlap slightly forming a black line. This line is caused by the combined effect of destructive interference. Pattern optical coatings can also be achieved using this method.
Some beneficial features of masking over the photoresist method are:
1- Fewer steps make setup time shorter.
2- Using softer less expensive coating materials.
3- Cost for prototyping is considerably less.
Please let us know about your specific requirements and we will be glad to present a proposal.
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